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      Question

      The Plasma Enhanced Chemical Vapor Deposition (PECVD)

      system inaugurated at IACS, Kolkata, was developed for fabrication of: 
      A Quantum chips Correct Answer Incorrect Answer
      B Hydrogen fuel cells Correct Answer Incorrect Answer
      C India’s first amorphous silicon solar cell Correct Answer Incorrect Answer
      D Semiconductor wafers Correct Answer Incorrect Answer
      E Lithium-ion batteries Correct Answer Incorrect Answer

      Solution

      The indigenously developed PECVD system at IACS is intended for fabrication of India's first amorphous silicon solar cell and supports the Atmanirbhar Bharat initiative.  

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